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Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

Technology Process

Home >Technology Process


Technology Process


Strong manufacturing capabilities along with a full-scale R&D and test lab give us the ability to fully control all process of raw materials preparing, manufacturing, inspection, packing and delivery.


Haohai Metal manufactures planar sputtering targets and rotary sputtering targets with main processes as below:


- Vacuum Melting for planar sputtering targets

Planar Target Flow.jpg

Typical Materials for this process of Planar targets include:

Pure Elements:

- Titanium Sputtering Targets - Zirconium Sputtering Targets - Niobium Sputtering Targets - Tantalum Sputtering Targets - Chromium Sputtering Targets - Vanadium Sputtering Targets - Aluminum Sputtering Targets - Halfnium Sputtering Targets - Nickel Sputteri Targets - Copper Sputtering Targets - Indium Sputtering Target etc.


Alloys:

Nickel Vanadium (NiV) Sputtering Targets - Nickel Chromium (NiCr) Sputtering Targets etc.


- Vacuum Melting for rotary sputtering targets

Rotary Target Flow.jpg

Typical materials for this process of Rotary Targets include:

Pure Elements:

- Titanium Sputtering Targets - Zirconium Sputtering Targets - Niobium Sputtering Targets - Tantalum Sputtering Targets - Vanadium Sputtering Targets - Aluminum Sputtering Targets - Halfnium Sputtering Targets - Nickel Sputteri Targets - Copper Sputtering Targets etc.


- HIP for planar sputtering targets

Powder Plannar Target Flow.jpg

Typical Materials for this process of Planar targets include:

Pure Elements:

- Silicon Sputtering Targets - Molybdenum Sputtering Targets - Chromium Sputtering Targets - Tungsten Sputtering Targets - Niobium Sputtering Targets - Tantalum Sputtering Targets etc. 


Alloys:

Nickel Chromium (NiCr) Sputteri Targets - Titanium Aluminum (TiAl) Sputtering Targets - Aluminum Chromium (AlCr) Sputtering Targets etc.


Ceremics:

NbOx Sputtering Targets - TiOx Sputtering Targets - SiOx Sputtering Targets 


- Spraying for rotary sputtering targets

Powder Rotary Target Flow.jpg

Typical Materials for this process of Planar targets include:

Pure Elements:

- Silicon Sputtering Targets - Molybdenum Sputtering Targets - Chromium Sputtering Targets - Tungsten Sputtering Targets  - ect. 


Alloys:

Nickel Chromium (NiCr) Sputteri Targets - Titanium Aluminum (TiAl) Sputtering Targets - Aluminum Chromium (AlCr) Sputtering Targets - Silicon Aluminum (SiAl) Sputtering Targets etc.


Ceremics:

NbOx Sputtering Targets - TiOx Sputtering Targets - SiOx Sputtering Targets