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Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

Zirconium Sputtering Targets, High Quality Cylindrical Targets, Thin Film Deposition, Monolithic, Column, Rotary, Planar, Cathodic ARC, PVD Coating

Haohai zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions.

Product Details

Zirconium Sputtering Target, High Quality, Monolithic, Column, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Zr Sputtering Targets Manufacturer and Vendor


ZIRCONIUM (Zr) SPUTTERING TARGET


As well as titanium products, zirconium is a main products of Haohai, we focus on zirconium materials and its application for a long time. Haohai zirconium sputtering target and arc cathodes are well known and extensively used in PVD coating field because of the high purity, fine grain sizes, homogeneous microstructure, excellent surface condition and accurate dimensions.


Haohai zirconium sputtering target include ziconium monolithic rotary sputtering target, zirconium planar sputtering target and arc cathodic target.

 



Zirconium Monolithic Rotary (Rotatable, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom Made

50 - 300

30 - 280

100 - 4000

 

Specification

Composition

Zr

Purity

R60702, 3N (99.9%), 3N5 (99.95%), 4N (99.99%)

Density

6.50 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum Melting, Forging, Extruding, Machining

Shape

Straight, Dog bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made

Surface

Ra 1.6 micron


Other Specification

✦ Vapor degreased and demagnetized after final machining

✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

 

Normal Sizes

Zirconium Rotary 

Sputtering Target


Normal Sizes


  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long


Compared to planar configurations, Haohai cylindrical sputtering target offer:

 Larger erosion zones that provide 2 to 2.5 times the material utilization

✦ Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance

 Custom manufacturing in monolithic, segmented or thermal spray formats

 End features that are precision machined for individual cathode system designs

 Reduce the cost of ownership for large area coating operations

 Variety of materials including

 Optimum grain size and uniform microstructure assure consistent process performance through full end of life

 Complete homogeneity and high purity levels produce consistent coverage

 Able to supply materials to any size operation from R&D to full-scale production

 



 

Zirconium Planar (rectangle, circular) Sputtering Target


Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 2000

10 - 1200

1.0 - 50.8

Circular

Diameter (mm)


Thickness (mm)

10 - 1000


1.0  - 100

 

Specification

Composition

Zr

Purity

R60702, 3N (99.9%), 3.5N (99.95%), 4N (99.99%), 4.5N (99.995%)

Density

6.50 g/cm3

Grain Sizes

< 80 micron or on request

Fabrication Processes

Vacuum melting, Forging, rolling, Machining

Shape

Plate, Disc, Step, Custom Made

Types

Monolithic, Multi-Segmented Target

Surface

Ra 1.6 micron

 

Other Specifications

Rectangle targets

Rolled plates, per ASTM B551

For rectangle targets, we cut big plates into sizes by water jet, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent. We can supply the layout of the master plate, our customer can trace the position of every part by our marking system.

 

Circular targets

Rolled bars, per ASTM B550

For the circular targets, we cut long bars into sizes by wire-electrode cutting, to make sure the composition, mechanical properties and the grain structure of every part in the same batch is homogeneous and consistent, we can supply the layout of the master bar, our customer can trace the position of every part by our marking system.

 

We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.




Zirconium Arc Cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




For our Zirconium Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or on request.


Impurities Content (wt%/ppm)

Zirconium Content [wt%]            


Zr 702 (wt%)

Zr (ppm)

Purity [%]


99.2

99.95

Metallic Impurities [μg/g]

Zr+Hf

99.2

-

Hf

4.5

-

Fe+Cr

0.2

-

Sn

-

16

Nb

-

0.03

Al-48
Si-35
Ti
-35
Cr-3.5
Fe-50
Ni-4
Mo-4

Pd

-

5

U

-

1

Non-Metallic Impurities [μg/g]

S

-

15

N

0.025

30

C

0.05

50

O

0.16

100

Guaranteed Density [g/cm3]


6.51

6.51

Grain Size [μm]


100

100

Thermal Conductivity [W/(m·K)]


22.7

22.7

Coefficient of Thermal Expansion [1/K]


5.8·10-6

5.8·10-6

Concentrations of other metal elements are too low to be determined.


Application

 Large Area Glass Coating (Low-E, Automotive)

 Wear Resistant Coating

 Decorative Coating

Optical Coating

 

Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our zirconium sputtering target, with high purity, include monolithic rotary (column, cylindrical) targets, planar (rectangle) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality targets.

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