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Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

Niobium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Nb Sputtering Targets Manufacturer and Supplier

Haohai is a professional manufacturer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers for thin film applications.

Product Details

Niobium Sputtering Target, High Purity, Monolithic, Rotatable, Rotary, Cylindrical, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron NB Sputtering Targets Manufacturer and Supplier



NIOBIUM SPUTTERING TARGET


Haohai is a professional manufacturer of Niobium sputtering targets with various shapes and purity, which are mainly applied to semi-conductive, micro-electronics industry, large area glass coating, and optical industry. Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity, as a result, you can benefit from a faster process due to higher sputtering speeds and obtain very homogeneous Niobium layers for thin film applications.

 

Haohai niobium sputtering targets include niobium monolithic rotatable sputtering targets, niobium planar sputtering targets and niobium cathodic targets.



 

Niobium Monolithic Cylindrical (rotary, rotatable) Sputtering Target

 

Manufacturing Range

OD (mm)ID (mm)Length (mm)Custom Made
50 - 30030 - 280100 - 4000


Specification

CompositionNb
Purity3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density8.58 g/cm3
Grain Sizes< 80 micron or on request
Fabrication ProcessesElectron beam (EB) Melting, Forging, Extruding, Machining
ShapeStraight, Dog Bone
End TypesSCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made
SurfaceRa 1.6 micron or on request

 

Other Specification

✦ Vapor degreased and demagnetized after final machining

✦ ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

✦ High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

✦ Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

 

Normal Sizes

Niobium Rotary 

Sputtering Target

Normal Sizes

  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long


Compared to planar configurations, Haohai cylindrical sputtering targets offer:

Larger erosion zones that provide 2 to 2.5 times the material utilization.

Longer target life that reduces the frequency of downtime for changeouts and chamber maintenance.

Custom manufacturing in monolithic, segmented or thermal spray formats.

 End features that are precision machined for individual cathode system designs.

 Reduce the cost of ownership for large area coating operations.

 Variety of materials including.

 Optimum grain size and uniform microstructure assure consistent process performance through full end of life.

 Complete homogeneity and high purity levels produce consistent coverage.

 Able to supply materials to any size operation from R&D to full-scale production.



 

Niobium Planar (rectangle, circular) Sputtering Target

 

Manufacturing Range

RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 200010 - 8001.0 - 25
CircularDiameter (mm)
Thickness (mm)
10 - 1000
1.0 - 50


Specification

CompositionNb
Purity3N (99.9%), 3.5N (99.95%), 4N (99.99%)
Density8.58 g/cm3
Grain Sizes< 80 micron or on request
Fabrication ProcessesElectron beam (EB) Melting, Forging, rolling, Machining
ShapePlate, disc, step, custom made
TypesMonolithic, multi-segmented target
SurfaceRa 1.6 micron or on request


Other Specifications

We make sure the same grain direction in the multi-segmented construction parts.

Flatness, clean surface, polished, free of crack, oil, dot, etc.

 



Niobium arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




For our Niobium Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or request.


Impurities Content [ppm]

Niobium Purity [%]Elements

3N5

[99.95]

Metallic Impurities [μg/g]Al5
Cr5
Cu10
Fe20
Hf20
Mn5
Mo10
Ni5
Si30
Ta50
Ti5
W15
Zr30
Non-Metallic Impurities [μg/g]C50
O50
H10
N50
S10
Guaranteed Density [g/cm3]8.57
Grain Size [μm]100
Thermal Conductivity [W/(m.K)]max.54
Coefficient of thermal expansion [1/K]7.3-6


Application

 Large Area Glass Coating

 Display Industry

 Wear Resistant Coating

Optical Coating

 Semi-conductive, Micro-electronics

 


Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our niobium sputtering target, with high purity, include monolithic rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality niobium targets.

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