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Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

Molybdenum Sputtering Target, High Purity, Monolithic, Rotatable, HIP, Cylindrical, Planar, Custom Made, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Mo Sputtering Targets Manufacturer and Supplier

Molybdenum thin films is one of the most important layers on the thin-film transistors which used in TFT-LCD flat displays, they provide instantaneous control for every individual pixel (screen speed) and consequently ensure particularly sharp image quality (display quality). Haohai Molybdenum sputtering targets and arc cathodes targets are perfectly performance in PVD Coating processes, to create outstanding thin films with particularly functions to satisfy our clients requirements.

Product Details

Molybdenum Sputtering Target, High Purity, Monolithic, Rotatable, HIP, Cylindrical, Planar, Custom Made, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Mo Sputtering Targets Manufacturer and Supplier



MOLYBDENUM (Mo) SPUTTRING TARGET


Molybdenum thin films is one of the most important layers on the thin-film transistors which used in TFT-LCD flat displays, they provide instantaneous control for every individual pixel (screen speed) and consequently ensure particularly sharp image quality (display quality). Haohai Molybdenum sputtering targets and arc cathodes targets are perfectly performance in PVD Coating processes, to create outstanding thin films with particularly functions to satisfy our clients requirements.

 

Our Molybdenum sputtering targets also widely used in the coating process for CIGS solar cells.

 

Haohai Molybdenum sputtering targets include Molybdenum rotary sputtering targets, Molybdenum planar sputtering targets and Molybdenum cathodic targets.



 

Molybdenum Rotatable (Rotary, Cylindrical) Sputtering Target


Manufacturing Range

OD (mm)

ID (mm)

Length (mm)

Custom Made

140 - 300

125 - 280

100 - 3300

 

Specification

Composition

Mo (Mo1, Mo2, TZM)

Purity

3N5 (99.95%)

Density

10.2 g/cm3

Grain Sizes

< 100 micron or on request

Fabrication Processes

Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding

Shape

Straight, Dog bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

Custom Made for SS Backing Tube

Surface

Ra 1.6 micron

 

Other specification

 Vapor degreased and demagnetized after final machining

 ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces

 

Normal Sizes

Molybdenum Rotary 

Sputtering Target


Normal Sizes


  55mm ID x   70mm OD x 1334mm Long

  80mm ID x 100mm OD x                Long

125mm ID x 153mm OD x   576mm Long

125mm ID x 153mm OD x   800mm Long

125mm ID x 153mm OD x   895mm Long

125mm ID x 155mm OD x   895mm Long

125mm ID x 153mm OD x 1172mm Long

125mm ID x 153mm OD x 1676mm Long

125mm ID x 153mm OD x 1940mm Long

125mm ID x 153mm OD x 1994mm Long

125mm ID x 153mm OD x 2420mm Long

125mm ID x 153mm OD x 3191mm Long

125mm ID x 153mm OD x 3852mm Long

125mm ID x 153mm OD x                Long

125mm ID x 180mm OD x   624mm Long

194mm ID x 219mm OD x 2301mm Long


 


  

Molybdenum Planar (rectangle, circular) Sputtering Target

 

Manufacturing Range

Rectangle

Length (mm)

Width (mm)

Thickness (mm)

Custom Made

10 - 3000

10 - 800

1.0 - 50.8

Circular

Diameter (mm)


Thickness (mm)

10 - 1000


1.0 - 100


Specification

Composition

Mo (Mo1, Mo2, TZM)

Purity

3N5 (99.95%)

Density

10.2 g/cm3

Grain Sizes

< 100 micron or on request

Fabrication Processes

Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding

Shape

Straight, Dog bone

End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

Custom Made for SS Backing Tube

Surface

Ra 1.6 micron

 

Other Specifications

Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

Excellent conductions, small linear expansion coefficient and good heat-resistance




Molybdenum arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets




For our Molybdenum Sputtering Target and Arc Cathodes


Tolerance 

Acc. to drawings or requirements.

 

Impurities Content (wt%)

Purity [%]

Mo

99.95

Metallic Impurities [μg/g]

Fe

0.005

Ni

0.002

Al

0.002

Si

0.003

Ca

0.002

Mg

0.001

Non-Metallic Impurities [μg/g]

O

0.003

N

0.001

C

0.005

P

0.001

Guaranteed Density [g/cm3]

10.2

Grain Size [μm]

100

 

Application

 Large Area Glass Coating

Display Coating

 Wear Resistant Coating

Decorative Coating

 Solar & Photovoltaic Industry

 


Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our molybdenum sputtering target, with high purity, include monolithic or bonding rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality molybdenum targets.

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