Categories
Contact Us

Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

Aluminum Sputtering Target, High Purity, Monolithic, Tubular, Rotary, Planar, Step, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Al Sputtering Targets Manufacturer and Supplier

Haohai aluminum sputtering target and arc cathodes with particularly homogeneous microstructure and outstanding surface quality are mainly used for metallization in thin-film transistors for TFT-LCD monitors, television sets, cell phone displays and CD.

Product Details

Aluminum Sputtering Target, High Purity, Monolithic, Tubular, Rotary, Planar, Step, Cathodic ARC, PVD Coating, Thin Film Deposition, Magnetron Al Sputtering Targets Manufacturer and Supplier


ALUMINIUM SPUTTERING TARGET

 

Haohai aluminum sputtering target and arc cathodes with particularly homogeneous microstructure and outstanding surface quality are mainly used for metallization in thin-film transistors for TFT-LCD monitors, television sets, cell phone displays and CD.

 

Haohai Aluminum Targets include Aluminum rotary sputtering targets, Aluminum planar sputtering targets and Aluminum cathodic targets.

 



Aluminum Rotatable (Rotary, Cylindrical) Sputtering Target

 

Manufacturing Range

OD (mm)ID (mm)Length (mm)Custom Made
80 - 25060 - 230100 - 4000


Specification

CompositionAl
Purity3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%), 5N (99.999%)
Density2.7 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesVacuum Melting, Machining
ShapeStraight, Dog bone
End Types

SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, 

Custom Made for SS Backing Tube

SurfaceRa 1.6 micron


Other Specification

 Vapor degreased and demagnetized after final machining.

 ID to be HONED and OD GROUND after raw tube is produced to ensure ID to OD concentricity meets drawing requirements.

 High vacuum tight, leak rate at any location not to exceed 1 x 10-8 STD CC/SEC.

 Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.

 


  

Aluminum Planar (Rectangle, Circular) Sputtering Target

 

Manufacturing Range

RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 200010 - 6002.0 - 40
CircularDiameter (mm)
Thickness (mm)
5.0 - 500
2.0 - 40


Specification

CompositionAl
Purity3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.995%), 5N (99.999%)
Density2.7 g/cm3
Grain Sizes< 100 micron or on request
Fabrication ProcessesVacuum Melting, Machining
ShapeMonolithic, Multi-segmented Target, Bonding
TypesPlate, Disc, Step, Down bolting, Threading, Custom Made
SurfaceRa 1.6 micron


Other Specifications

Flatness, clean smooth surface, polished, free of crack, oil, dot, etc.

Excellent conductions, small linear expansion coefficient and good heat-resistance.

 



Aluminum arc cathodes

We supply rotary and planar arc cathodes as well as rotary and planar sputtering targets

 



For our Aluminum sputtering targets and arc cathodes

 

Tolerance

Acc. to drawings or on request.

 

Haohai provides Aluminum sputtering targets and arc cathodes continually and improves the following material and coating properties:

 Fine grain size and homogeneous microstructure

 High Ductility

 Outstanding material hardness

 Excellent resistance to oxidation

 Coefficient of friction

 Temperature resistance

 Thermal conductivity

 High electrical conductivity


Impurities Content [ppm] 

Aluminum Content
Al
Purity [%]
99.999
Metallic Impurities [ppm]AlMatrix
Cu1.3
Cr0.145
Co0.75
Fe2.8
Mg1.4
Mn0.16
Ni0.25
Si2.4
Non-Metallic Impurities[ppm]O10
S0.2
N1
C10
Guaranteed Density [g/cm3]2.7
Grain Size [μm]100
Thermal Conductivity [W/(m·K)]238


Application

 Display Industry

 Decorative Coating

 Optical Coating

 Solar & Photovoltaic Industry

 Semiconductors




Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets and arc cathodes. Our aluminum sputtering target, with high purity, include monolithic rotatable (rotary, tubular, cylindrical) targets, planar (rectangle, disc) targets, and arc cathodes, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality alumimum targets.

Related Products
Feedback