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Haohai Metal Meterials Co., Ltd.

Adress:

Plant No.19, TusPark, Century Avenue, 

Xianyang City, Shaanxi Pro., 712000, China


Tel:  

+86 29 3358 2330 

+86 29 3358 2349


Fax: 

+86 29 3315 9049


E-mail: 

info@pvdtarget.com

sales@pvdtarget.com



Service Hotline
029 3358 2330

AlCr Sputtering Target, High Quality, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, HIP, Powder Metallurgical, Magnetron AlCr Sputtering Targets Manufacturer And Supplier

Haohai Metal offers the full range of compositions of the AlCr sputtering targets and cathodes, with the highest purity, density and homogeneity. The powder metallurgical production routes allow us to introduce other additional elements for creating tailored coatings. Our AlCr sputtering targets and cathodes are particularly resistant to breakage and long-lasting, we can be your most reliable partner for AlCr target materials.

Product Details

AlCr Sputtering Target, High Quality, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, HIP, Powder Metallurgical, Magnetron AlCr Sputtering Targets Manufacturer And Supplier


ALUMINIUM CHROMIUM SPUTTERING TARGET


AlCrN coatings are widely used for tool coating, where outstanding high temperature wear resistance is needed and highest oxidation resistance is beneficial. Those properties can be even more pronounced by selective alloying with other elements. (Al, Cr)2O3 coatings have been introduced to the coating market quite recently. These new types of PVD coatings are intended to compete with Al2O3 coatings produced by CVD. As the PVD process is limited in temperature, the formation of pure alpha-aluminumoxide is not possible yet. The addition of Cr to the target material results in a growth of mixed (Al, Cr)2O3 in the preferred corundum structure. 


Haohai Metal offers the full range of compositions of the AlCr sputtering targets and cathodes, with the highest purity, density and homogeneity. The powder metallurgical production routes allow us to introduce other additional elements for creating tailored coatings. Our  AlCr sputtering targets and cathodes are particularly resistant to breakage and long-lasting, we can be your most reliable partner for AlCr target materials.


Haohai Metal's AlCr sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.




Aluminium Chromium Planar (Rectangle, Circular) Sputtering Target


Manufacturing Range

RectangleLength (mm)Width (mm)Thickness (mm)Custom Made
10 - 200010 - 6001.0 - 25
CircularDiameter (mm)
Thickness (mm)
10 - 400
1.0 - 25


Specification

Composition [at%]

Al/Cr 

30/70, 50/50, 70/30,

Purity2N7 (99.7%), 3N (99.9%), 3.5N (99.95%)
Density4.5 g/cm3 for 50/50 at%, 3.98 g/cm3 for 70/30 at%
Grain Sizes< 80 micron or on request
Fabrication ProcessesPowder Metallurgical, Hot Isostatic Pressing(HIP), Machining
ShapePlate, Disc, Step, Down bolting, Threading, Custom Made
TypeMonolithic, Multi-segmented Target, Bonding
SurfaceRa 1.6 micron or on request


 

Other Specifications

 We make sure the same grain direction in the multi-segmented construction parts.

 Flatness, clean surface, polished, free of crack, oil, dot, etc.

 High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.




Aluminium Chromium Arc Cathodes

We supply Alunimium Chromium planar arc cathodes as well as Alunimium Chromium planar sputtering targets




For our Aluminium Chromium Sputtering Targets and Arc Cathodes


Tolerance 

Acc. to drawings or request.


Impurities Content [wt%]

Aluminium Chromium Purity [%]Elements

70/30 at%, 3N

[99.9]

Metallic Impurities [μg/g]Al54.465
Cr45.1
Fe0.125
Si0.215
Cu0.002
Mn0.004
Non-Metallic Impurities [μg/g]C0.015
O0.071
S0.004
H0.002
N0.002
Guaranteed Density [g/cm3]3.98
Grain Size [μm]80
Thermal Conductivity [W/(m.K)]-
Coefficient of thermal expansion [1/K]-


Analytical Methods: 

1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593). 

2. Gas elements were analyzed using LECO GAS ANALYZER .                                              

 C,S determined by Combustion-lR

 N,H determined by IGF-TC

 O determined by IGF-NDIR    


Application:

 Solar Photovoltaic

 Flat Panel Displats

 Wear Resistant Coating




Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our AlCr sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality AlCr targets.



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